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     Available measurement techniques:

 

     Equipment:

PANalytical X’Pert PRO MRD diffraction system with static CuKa X-ray tube; horizontal high resolution goniometer; 5-axis Euler cradle; modular PreFIX X-ray optical elements; easily changeable line / point focus; PIXcel 3D solid state area detector (255x255 pixels, 14x14mm, linearity: 50 kcps/pixel,  12.8 Mcps/strip); Sample size: diameter < 100mm, thickness < 15mm , sample weight < 1kg.

 

Non-ambient high temperature chamber type Anton Paar DHS 1100 with domed heated stage; range: RT..1100°C;  cooling via pressed dry  air;  geometry of holder with graphite  dome allows usage of Euler cradle;  at normal pressure or rough vacuum, inert gasses, nitrogen, oxygen, air; ramp up max. 500°C/min; Sample size: diameter < 20mm, thickness < 2.4mm

2nd diffraction system: PHILIPS Material Research Diffractometer; HRXRD/RSM, XRR:  Adjustable four-crystal monochromator Ge220/Ge440; Triple axis /Receiving slit  module; XRD with suppressed fluorescence: Cross-slit collimator, Parallel plate collimator + diffracted beam monochromator

 

Typical results

In-situ study of recrystalization in vanadium oxide layer deposited by sol-gel method on glass substrate.

 

 

Texture pole figure measured in 211 diffraction position of TiO2-Rutile layer sputtered on r-cut Al2O3.

 

Example of high resolution reciprocal space maps of epitaxial LSMO/BTO/YSZ/Si/SiO2/Si.

 

     Staff:

doc. Dr.techn. RNDr. Tomáš Roch

e-mail: This email address is being protected from spambots. You need JavaScript enabled to view it. , Phone: +421-2-60295-270, 189